6CMaterials

6C Materials

6C002 Optical sensor materials as follows:

a. Elemental tellurium (Te) of purity levels of 99.9995% or more;

b. Single crystals (including epitaxial wafers) of any of the following:

1. Cadmium zinc telluride (CdZnTe), with zinc content of less than 6% by ‘mole fraction’;

2. Cadmium telluride (CdTe) of any purity level; or

3. Mercury cadmium telluride (HgCdTe) of any purity level.

‘Mole fraction’ is defined as the ratio of moles of ZnTe to the sum of moles of CdTe and ZnTe present in the crystal.

6C004 Optical materials as follows:

a. Zinc selenide (ZnSe) and zinc sulphide (ZnS) “substrate blanks”, produced by the chemical vapour deposition process and having any of the following:

1. A volume greater than 100 cm3; or

2. A diameter greater than 80 mm and a thickness of 20 mm or more;

b. Electro‑optic materials and non‑linear optical materials, as follows:

1. Potassium titanyl arsenate (KTA) (CAS 59400‑80‑5);

2. Silver gallium selenide (AgGaSe2 , also known as AGSE) (CAS 12002‑67‑4); or

3. Thallium arsenic selenide (Tl3AsSe3, also known as TAS) (CAS 16142‑89‑5);

4. Zinc germanium phosphide (ZnGeP2, also known as ZGP, zinc germanium biphosphide or zinc germanium diphosphide); or

5. Gallium selenide (GaSe) (CAS 12024‑11‑2);

c. Non‑linear optical materials, other than those specified by 6C004.b., having any of the following:

a. Dynamic (also known as non‑stationary) third order non‑linear susceptibility ((3), chi 3) of 10‑6m2/V2 or more; and

b. Response time of less than 1 ms; or\

2.  Second order non‑linear susceptibility ((2), chi 2) of 3.310‑11 m/V or more;

d. “Substrate blanks” of silicon carbide or beryllium beryllium (Be/Be) deposited materials, exceeding 300 mm in diameter or major axis length;

e. Glass, including fused silica, phosphate glass, fluorophosphate glass, zirconium fluoride (ZrF4 ) (CAS 7783‑64‑4) and hafnium fluoride (HfF4 ) (CAS 13709‑52‑9) and having all of the following:

1. A hydroxyl ion (OH‑) concentration of less than 5 ppm;

2. Integrated metallic purity levels of less than 1 ppm; and

3. High homogeneity (index of refraction variance) less than 5 x 10‑6;

f. Synthetically produced diamond material with an absorption of less than 10‑5cm‑1 for wavelengths exceeding 200 nm but not exceeding 14,000 nm.

6C005 "Laser" materials as follows:

 a. Synthetic crystalline “laser” host material in unfinished form as follows: